Non-contact measurement of resistivity, thickness and conductivity (P/N)
Number of cassette station can be changed by customers request
Eddy current method for resistivity, Electric capacitance method for wafer thickness
Temperature correction for silicon wafer function
Sample
sizes
3 ~ 8 inch
Measuring range
[R] 1m ~ 200Ω・cm
[Thickness] 150 ~ 800μm (300μm between 150 and 800μm is recommended)
The range is separated from each Low, Middle, High and S-High probe type.
