High accuracy measurement system for large diameter wafer
Non-contact measurement of resistivity, thickness and conductivity
(P/N)
Compact design of Two-stage by measuring area and transfer area
Number of cassette station can be changed by customers request
Option : Add wafer flattness measurement system(FLA-200)
Sample
sizes
6 ~ 8 inch, or 12 inch
Measuring range
[R] 1m ~ 200Ω・cm
[Thickness] 150 ~ 800μm (300μm between 150～800μm)
The range is separated from each Low, Middle, High and S-High probe
type
